自聚焦透镜高效批量加工的双面研磨抛光法研究

依据双面研磨抛光原理，提出了加工自聚焦透镜平面和斜面辅助工装设计.从工艺技术特点和生产实际过程等方面对设计的工装使用情况进行分析验证.多次大批量加工实践证明，该辅助工装的设计完全满足了自聚焦透镜高效批量加工技术要求，简化整个生产线工艺，减少工艺流程时间，降低材辅料的消耗成本，从而验证了双面研磨抛光法是一种实用的加工自聚焦透镜的新方法.     

半球蓝宝石整流罩制造技术研究

整流罩在高速飞行中既要对空气进行整流,同时又起光学窗口的作用。蓝宝石材料硬度高,加工非常困难。分别从精磨模、精磨磨料、抛光膜层、抛光辅料、机床速度和压力等方面介绍了一种加工蓝宝石整流罩的工艺方法。     

NMR investigation of concentrated alumina and silica slurries

The longitudinal relaxation times (T₁) of water in concentrated silica and alumina slurries were measured as a function of solids content. It was shown that the results could be fit very well with a two-phase fast-exchange model between free and surface-bound water. As expected, values of T₁ for bound water were in the order of 20–2000 times lower than that for free water, indicating a higher effective viscosity of the surface-bound water. The strength of the interaction depended on the particular surface, and all of the aluminas examined interacted more strongly with water than the two silicas studied, which themselves differed considerably. The chemical mechanical polishing (CMP) removal rate of tantalum by silica slurries was shown to be directly correlated with the interaction parameters, derived from the NMR relation times rather than with total surface hydroxyl group concentration.     

环境友好助洗剂——4A沸石

介绍了4A沸石的结构、性质及其作为洗涤助剂等方面的应用和国内外发展状况。     

水合醋酸铈直接热分解制备超细氧化铈及其抛光性能

Ultra fine ceria was prepared by calcining hydrate cerium acetate. The effects of pyrolysis temperature on the particle size, morphology, specific surface area and loose packing density of ceria were investigated, and the removal rate of optical glasses polishing by ceria was determined. The results show that with the increase of pyrolysis temperature, the loose deposit density and crystallinity increases and the specific surface area decreases, however, the particle size decreases firstly and then increases, the minimum medium particle size D₅₀ is 0.47 μm at pyrolysis temperature of 1 000 ℃. The SEM images of ceria prepared by the decomposition at 800 ℃ or at 1 100 ℃ show porous powders or quasi-sphere small particles with loosely agglomeration, respectively. It was found that the removal rate varied with pyrolysis temperature in preparation of ceria and the property of glass polished. The removal rate for three kinds of glasses was in the order of ZF7> F1> K9, and the maximum value appeared at around 1 000 ℃ for ZF7 and F1, and at around 1 100 ℃ for K9.     

N-丙基-N-[2-(2,4,6-三氯苯氧基)乙基]-1H-咪唑-1-甲酰胺的合成

以2，4，6-三氯苯酚和1，2-二氯乙烷为初始原料，在相转移催化剂十六烷基三甲基溴化胺和弱碱性助剂三乙胺存在下合成了N-丙基-N-[2-(2，4，6-三氯苯氧基)乙基]-1H-咪唑-1-甲酰胺，其结构经元素分析,IR，^1H NMR分析证实。并对该合成路线的反应机理进行了讨论。     

优化全日制化学教育硕士培养模式的探讨

全日制教育硕士（学科教学·化学）研究生培养是一个具有挑战性的、全新的研究课题。从"目标定位""课程优化"和"实践提升"3个方面对化学教育硕士培养进行探讨。在"目标定位"上应培养化学教育硕士具有较强的化学课堂教学能力和教研能力，在"课程优化"上，应优化更具功能化和结构化的课程体系，在"实践提升"上应搭建基于科学态磨课的全类型、全环节的实践平台。     

能动抛光磨盘的变形实验研究

 能动抛光磨盘实时产生不同的表面变形，在对大口径非球面光学元件进行精磨和抛光时实现与工件表面良好的大尺寸吻合，可以消除传统光学加工采用小尺寸磨头时带来的高频残余误差并提高加工效率。以加工直径1.3m左右，F/2的抛物面光学元件为例，对能动磨盘在不同离轴度时能够产生的变形进行了计算和实验。结果表明，能动磨盘能够以较高精度产生旋转对称或非对称的抛物面形状。对能动磨盘产生变形后的残余误差进行了分析。     

高精度中小11径非球面修抛技术研究

为实现高精度中小口径非球面的加工，介绍了一种非球面修抛技术。基于Preston假设，将抛光过程描述成一个线性方程，计算得到材料的去除量与抛光时间、抛光压力和零件转速之间的函数关系。设计了整体修抛法和环带修抛法两种方法，在数控抛光的基础上，对口径为Ф117mm的凹抛物面和口径为Ф17mm凸双曲面进行修抛，修抛后非球面的面形精度PV值为0．184μm，RMS均小于0．032μm，达到了工程化应用要求，实现了中小口径非球面的高精度加工。     

Fourier analysis of scratches generated on m‐GaN substrates during polishing

Generation of scratches on surface of m‐plane GaN substrates due to polishing was studied by atomic force microscopy (AFM). For epi‐ready substrates AFM images confirm a flat surface with the atomic step roughness while a lot of scratches are visible in AFM images for partially polished GaN substrates. The Fourier analysis of AFM images show that scratches propagate easier along {c‐plane} and {a‐plane} directions on m‐plane GaN surface. This observation is an evidence of anisotropy of mechanical properties of GaN crystals in the micro‐scale. This anisotropy is directly correlated with the symmetry and atomic arrangement of m‐plane GaN.